Abstract

• The effect of Cu,Al and In doping on the microstructural and structural properties of the SnO2 thin films were studied. The undoped, Cu, Al and In (5 mol%) dopedSnO2 thin films were deposited on glass substrates by sol-gel and spin coating technique. The microstructure properties of the samples were investigated by X-ray diffraction (XRD) method. It was determined that the samples formed at polycrystalline structure in tetragonal phase and structure was not changed by doping materials. The surface morphology of the samples were investigated by scanning electron microscopy (SEM). The lattice parameters, unit cell volume, crystallite size and grain size were determined.