Abstract

• In this research work, anatase TiO2 sample was mixed with the methoxyethanol solution was used as the starting materials. The n type Silicon <100> plane was used as a substrate. The silicon substrate was annealed at 1000°C in furnace. The mixture solution was deposited on SiO2/Si substrate using spray pyrolysis- like method at different temperatures at 100°C, 200°C and 300°C respectively. The structural properties of TiO2/SiO2/Si films were analysed by XRD. The morphological properties of these films were determined by SEM. The optical properties of films were investigated by UV-Vis spectrophotometer.